Megasonic cleaning

Megasonic Cleaning is a type of acoustic cleaning, related to ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is used in wafer, medical implant, and industrial part cleaning.

Similar to ultrasonic cleaning, megasonics utilizes a transducer that usually sits atop a piezoelectric substrate. The transducer creates an acoustic field at a much higher frequency (typically 0.8–2 MHz) compared to ultrasonic cleaning (20-200 kHz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.